Spectral Film Thickness Measurement System

Features: Utilizing a spectrometer to measure the reflected interference spectral signals from the sample, in order to obtain information about thin film thickness, refractive index, extinction coefficient, transmittance, reflectance, and chromaticity, among other material properties.

Obtaining accurate values even under vibration conditions.
Suitable for In-line inspection on production lines.
Utilizing a spectrometer to measure the reflected interference spectral signals from the sample, to obtain thin film structure and material parameters.
Measurement of thin film thickness, refractive index, extinction coefficient, transmittance, reflectance, and chromaticity.
Applied in industries such as semiconductors, displays, touch panels, solar cells, optical coatings, etc.

Items	Specifications
Measurement Type	Macro System
Spot Size （Dia.）	1～5 mm
Wavelength Range	350～850 nm （Option）
Thickness Range	10 nm～30μm（up to 250 μm）
Thickness Repeatability	<1 nm @ 500 nm Oxide on Si substrate
Transmission Repeatability	<0.5%
Reflection Repeatability	<0.5%
Chromaticity Repeatability	x，y < 0.0005
Data Interface	USB
Layer Numbers	Up to 5 (or more)
Film Materials	Oxide，Nitride， ITO，CF，OLED film@ Si，Glass，PET.
Others	Refractive index (n), Extinction coefficient (k), Reflectance, Transmittance, Chromaticity measurement

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